The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.
It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.
The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.
Reaction Chamber
Control Panel
Withthe215mm diameter large caliberchamber
FORWARD/REFLECT indicatebydigital
Operation Flowchart
Piping System Diagram
Specifications
Model
PR500
PR510
Method
Barrel type of direct plasma
Controlpart
Highfrequency output
Max.500W
Oscillating frequency
13.56MHz
Outputimpedance
50Ω
Tuningmethod
Automatic tuning
Instrument
Output watt meter (0 to 600W) Reflected wave watt meter (0 to 300W) Vacuum gauge, thermocouple type Flow meter, needle valve integrated type, 2 sets
Timer
0.1sec. to 999h
Gasinlet
1/4"stainless steel, 2 inlet
Powersource (50/60Hz)
AC100/220V, single phase, 2 kVA
Reactionpart
Reactionchamber
Madeof quarts, φ215×305mm
Electrodestructure
Condenser type, 4-way split
Controlsystem
Autopressurereduction, auto leak valve
TouchpanelwithPLC control
Pipingmaterial
SUS,Teflon
Externaldimensions(W×D×Hmm)
438×520×760
520×630×760
Weight
Approx.38kg
Approx.60kg
StandardAccessories
Connection cable :1completeset
Vacuum grease : 1 pc.
O-ring for reaction chamber:1pc.
OptionalAccessories
Frame for wafers, 2, 3,4,5, 6 inches Multipurposeangledframe Aluminum etchingtunnelStand