ThisEquipment is Atmosphere Plasma for cleaningsamplesurface. Easy to make In-Line system with otherEquipment.UnifyandSeparation Type available, Also, Two kindsofElectronics(Insertion and Spout) type available.
Feature
Does not need Vacuum systemsuchasVacuum pump and Vacuum chamber.
Reaction gas use He,Ar andO2mixinggas for cleaning sample surface.
Sample
Sanplesize : Any size okay(W) x 45(D) x Max. 15(T)mm
Equipment Function
Loading Sample
Useing conveyor or Armchuckforloading sample
Sample are continuanceloadingtoelectrode.
Un-load sample.
Go to next process
Automatic andManualoperationselectable.
Touch panel operation
Two Electrode can build inforheavydirt cleaning of sample surface.
Easy to install and easytomakeIn-Line system.
Electrode and Main unitcanbeseparately. Also, One controller cancontrolTwoElectrode.
ExternalDimension
Systemstructure
Unify type : W800 xL700xH1200mm
Separately type : W800 xL700xH950mm
Electrode unit
RF generator unit (Inthecontrolunit)
Gas flow unit (Inthecontrolunit)
Touch panel (On controlunit)
Cooling unit (Option)
Loading andUn-loadingunit(Option)
Electrodeunit
Gasflowunit
Two parallel flat plate. Gas input hole for fill up mixing gas (He and Ar). Also, water cooling port. (IN and OUT)
Mass flow controller system
Ar : Max. 5L/min
He : Max. 5L/min
Oxygen : Max. 200mL/min
Electrode spec.
Electrode : Aluminum Up to W300xL50x H20mm Water Cooling type.
Around electrode matirial:Quartzglass
Controlunit
Powersupply
Touch panelandprogrammablecontroller (PLC)
1. Set process recip Gas flow RF power oading speed (Conveyorspeedetc.)